| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition for liquid immersion exposure, a cured pattern forming method and a cured pattern which are suitably used in a liquid immersion exposure process for exposing a resist film via a liquid for liquid immersion exposure such as water.SOLUTION: The radiation-sensitive resin composition for liquid immersion exposure of the invention has a structure obtained by hydrolytic condensation of at least one selected from silane compounds represented by the formula [RSiX] and silane compounds represented by the formula [SiX], and contains a silicon-containing polymer having a weight average molecular weight of 1000 to 200000 according to GPC, a fluorine-containing polymer, an acid generator and a solvent. (In the formulas: Rrepresents a fluorine atom, an alkylcarbonyloxy group or an alkyl group having 1 to 20 carbon atoms; X represents a chlorine atom, a bromine atom or OR(where R is a monovalent organic group); and a represents an integer from 1 to 3.) |
