| 摘要 |
PROBLEM TO BE SOLVED: To improve the properties of general negative-type photosensitive materials that produce a negative (reverse) taper shape or an overhang shape having an extremely protruding upper portion in a formed hole or space pattern, enable formation of a fine pattern in a wide wavelength range, and also enable pattern formation with high sensitivity with low light absorption in a photo-curing resin layer on a substrate itself due to high transparency in the exposure wavelength range even when the resin layer is thick.SOLUTION: A photocurable resin composition comprises: (A) a polymer composition of a weight average molecular weight of 3,000-500,000 whose base resin contains repeating units of formula (1); (B) a photo acid generator; (C) a cation of ammonium ion and an anion of an ammonium salt; (D) a crosslinking agent; and (E) a solvent. |
