| 摘要 |
The present invention relates to an ion beam machining apparatus equipped with an electrode structure for evening the spread of ion beam charge density and a substrate processing method using the same for substrate processing using ion beams such as etching, implanting and ion plating. The present invention comprises: an ion producing unit equipped with a function of producing ions to process substrates; a process chamber where substrates are processed by ion beams; a first ion beam controlling unit equipped with a function of forming ion beams with certain amount of energy, after receiving ions from the ion producing unit; and a substrate holding unit with a substrate holder, supporting the substrates, for secondly controlling the ion beams introduced inside of the process chamber by forming an electric field between the first ion beam controlling unit. Additionally, certain patterns are formed on the upper surface of the substrate holder, and the strength of electric fields differs in each patterned area on the substrate holder, thereby reducing the differences of charge density in each area on the substrates of ion beams reaching the substrates. |
