发明名称 X線反射装置の製造方法
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of an X-ray optical device that is an X-ray concentrating imaging system that can be easily manufactured, is light weight, and has good imaging performance, and has dramatically improved reflectance and an energy band.SOLUTION: There is provided an X-ray optical device in which reflection films of HfOand AlOor the like are deposited with the accuracy at sub nm level by using an atomic layer deposition method, on a lateral wall having a curved surface hole structure produced in silicon and nickel that are materials having a fine structure by using a micromachining technology.
申请公布号 JP5920796(B2) 申请公布日期 2016.05.18
申请号 JP20140179079 申请日期 2014.09.03
申请人 公立大学法人首都大学東京;国立研究開発法人宇宙航空研究開発機構 发明人 江副 祐一郎;三石 郁之;満田 和久;ジョゼフ ジェイ タルグハーダ
分类号 G21K1/06;G21K1/00 主分类号 G21K1/06
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