发明名称 |
VACUUM ARC VAPORIZATION SOURCE, AND AN ARC VAPORIZATION CHAMBER WITH A VACUUM ARC VAPORIZATION SOURCE |
摘要 |
The vaporization source has a cathode body (3) including a vaporization material (31) as a cathode (32) for generation of arc discharge at a vaporization upper surface (33) of the cathode. The body is limited by a cathode base (34) in an axial direction, and by the surface in another axial direction. A circular magnetic field source (2) is arranged parallel or anti-parallel to a surface normal (300) of the surface, and concentric to the normal. A magnetic field reinforcement ring (4) is arranged in front of the base on a side turned away from the surface at a preset distance (A2). |
申请公布号 |
EP2140476(B1) |
申请公布日期 |
2016.05.18 |
申请号 |
EP20080717591 |
申请日期 |
2008.03.11 |
申请人 |
OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON |
发明人 |
VETTER, JÖRG |
分类号 |
H01J37/32;H01J37/305 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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