发明名称 Charged particle beam pattern writing method and charged particle beam writing apparatus that corrects beam rotation utilizing a correlation table
摘要 A charged particle beam pattern writing method according to an embodiment, includes measuring a position displacement amount of a stage above which a target object is placed, in a rotation direction; and writing a pattern of a beam image on the target object above the stage while the beam image is rotated, by using a plurality of electrostatic lenses at least one of which is arranged in a magnetic field of each of the plurality of electromagnetic lenses whose magnetic fields are in opposite directions, to avoid a focus displacement of a charged particle beam passing through the plurality of electromagnetic lenses and to correct the position displacement amount measured, in the rotation direction of the stage.
申请公布号 US9343266(B2) 申请公布日期 2016.05.17
申请号 US201313950466 申请日期 2013.07.25
申请人 NuFlare Technology, Inc. 发明人 Ogasawara Munehiro;Touya Takanao;Tamamushi Shuichi
分类号 H01J37/317;H01J37/145;H01J37/304;B82Y10/00;B82Y40/00 主分类号 H01J37/317
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A charged particle beam pattern writing method comprising: placing a target object above a stage; measuring a position displacement amount of the stage in a rotation direction; arranging at least one of a plurality of electrostatic lenses in a magnetic field of each of a plurality of electromagnetic lenses; arranging adjacent electromagnetic lenses in the plurality of electromagnetic lenses to have magnetic fields oriented in opposite directions; writing a pattern of a beam image on the target object above the stage while the beam image is rotated using the plurality of electrostatic lenses; storing a correlation table in a storage device, the correlation table storing, for each of a plurality of rotation angles of the beam image, a set of voltages to be applied to each of the plurality of electrostatic lenses to correct for a correlated rotation angle without changing a focus position of a charged particle beam; acquiring, from the stored correlation table, a set of voltages to be applied to each of the plurality of electrostatic lenses that correlates to the measured position displacement amount in the rotation direction; and applying the set of voltages acquired from the stored correlation table to each of the plurality of electrostatic lenses to correct the position displacement amount measured in the rotation direction of the stage while simultaneously maintaining an unchanged focus position of the charged particle beam passing through the plurality of electromagnetic lenses.
地址 Numazu-shi JP