Ion implanter, beam energy measuring device, and method of measuring beam energy

摘要

A beam energy measuring device in an ion implanter includes a parallelism measuring unit that measures a parallelism of an ion beam at a downstream of a beam collimator of the ion implanter and an energy calculating unit that calculates an energy of the ion beam from the measured parallelism. The ion implanter may further include a control unit that controls a high energy multistage linear acceleration unit based on the measured energy of the ion beam so that the ion beam has a target energy.

主权项

1. An ion implanter comprising:
a beam collimator that has a focus on a beam reference trajectory and deflects a plurality of beam trajectories, directed from the focus to the beam collimator at different respective incident angles on a plane containing the beam reference trajectory, at different deflection angles in accordance with the respective incident angles so that each of the plurality of beam trajectories is parallel to the beam reference trajectory under a target beam energy; a parallelism measuring unit that measures a beam parallelism, representing an error of a beam angle in a direction in the plane, the direction being perpendicular to the beam reference trajectory, of an ion beam passing through the beam collimator at a downstream of the beam collimator; and an energy calculating unit that calculates an energy deviation amount of the ion beam from the target beam energy based on the beam parallelism.