Method for producing multiple-surface imposition vapor deposition mask, multiple-surface imposition vapor deposition mask obtained therefrom, and method for producing organic semiconductor element

摘要

A method for producing a multiple-surface imposition vapor deposition mask enhances definition and reduces weight even when a size is increased. Each of multiple masks in an open space in a frame is configured by a metal mask having a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows. In formation of the plurality of masks, after each of the metal masks and a resin film material for producing the resin mask are attached to the frame, the resin film material is processed, and the openings corresponding to the pattern to be produced by vapor deposition are formed in a plurality of rows lengthwise and crosswise, whereby the multiple-surface imposition vapor deposition mask of the above described configuration is produced.

主权项

1. A method for producing a multiple-surface imposition vapor deposition mask formed by arranging a plurality of masks in an open space in a frame by dividing the plurality of masks in lengthwise and crosswise directions of the open space, comprising the steps of:
preparing the frame; attaching a plurality of metal masks provided with slits, and a resin film material positioned on front surface sides of the plurality of metal masks, to the frame; and producing a resin mask by processing the resin film material, and forming openings corresponding to a pattern to be produced by vapor deposition in a plurality of rows lengthwise and crosswise.