发明名称 |
Semiconductor device including a local wiring connecting diffusion regions |
摘要 |
A semiconductor device has first conductivity type regions extending in a first direction, and second conductivity type regions extending in the first direction. The first conductivity type regions and the second conductivity type regions are alternately arranged in a second direction perpendicular to the first direction. The semiconductor device includes a first impurity diffused regions formed in the first conductivity type regions, a first local wiring connected to the first conductivity type regions, and extending in the second direction, a first potential supply wiring formed above the first local wiring, and extending in the first direction, and a first contact hole for connecting the first local wiring to the first potential supply wiring. |
申请公布号 |
US9343461(B2) |
申请公布日期 |
2016.05.17 |
申请号 |
US201414489188 |
申请日期 |
2014.09.17 |
申请人 |
SOCIONEXT INC. |
发明人 |
Shimbo Hiroyuki;Tamaru Masaki |
分类号 |
H01L27/092;H01L21/8238;H01L27/02;H01L23/538;H01L29/423 |
主分类号 |
H01L27/092 |
代理机构 |
McDermott Will & Emery LLP |
代理人 |
McDermott Will & Emery LLP |
主权项 |
1. A semiconductor device comprising:
a plurality of first conductivity type regions extending in a first direction, and a plurality of second conductivity type regions extending in the first direction, the plurality of first conductivity type regions and the plurality of second conductivity type regions being arranged such that the plurality of first conductivity type regions and the plurality of second conductivity type regions are alternately arranged in a second direction perpendicular to the first direction; a plurality of first impurity diffused regions formed in the plurality of first conductivity type regions; a first local wiring in direct contact with the plurality of first impurity diffused regions, and extending in the second direction above the plurality of first conductive type regions and the plurality of second conductive type regions; a first potential supply wiring formed above the first local wiring, and extending in the first direction; and a first contact hole for connecting the first local wiring to the first potential supply wiring. |
地址 |
Kanagawa JP |