MEMS device with non-planar features

摘要

A MEMS device is formed with facing surfaces of a contoured substrate and a layer of material having complementary contours. In one fabrication approach, a first photoresist layer is formed over a substrate. Selected regions of the first photoresist layer are exposed using a patterning mask. The exposed regions of the first photoresist layer are thermally shrunk to pattern the first photoresist layer with a contour. A layer of material is formed over the contoured first photoresist layer.

主权项

1. A method of forming a MEMS device, comprising:
forming a photoresist layer over a substrate after the substrate is a contoured substrate; exposing selected regions of the photoresist layer using a mask; thermally shrinking the photoresist layer such that exposed regions of the photoresist layer form a contour in the photoresist layer; and forming a layer of material over the contoured photoresist layer; wherein facing surfaces of the contoured substrate and the layer of material have complementary contours.