发明名称 |
Plasma processing apparatus |
摘要 |
A plasma processing apparatus has a long chamber having an opening portion, a gas supply apparatus that supplies gas into the chamber, a spiral coil having a long shape in parallel with the longitudinal direction of the chamber, a high-frequency electric power supply connected to the spiral coil, a base material mounting table which is disposed opposite to the opening portion and holds a base material and a moving mechanism which is disposed in parallel with the longitudinal direction of the chamber and the longitudinal direction of the opening portion, and enables the chamber and the base material mounting table to relatively move perpendicularly with respect to the longitudinal direction of the opening portion. |
申请公布号 |
US9343269(B2) |
申请公布日期 |
2016.05.17 |
申请号 |
US201213661115 |
申请日期 |
2012.10.26 |
申请人 |
Panasonic Intellectual Property Management Co., Ltd. |
发明人 |
Okumura Tomohiro;Kawaura Hiroshi |
分类号 |
H05H1/46;H01J37/32;H05H1/30 |
主分类号 |
H05H1/46 |
代理机构 |
PIPM |
代理人 |
PIPM |
主权项 |
1. A plasma processing apparatus comprising:
a chamber having an opening portion; a gas supply apparatus that supplies gas into the chamber; two spiral coils; a high-frequency electric power supply connected to the spiral coils; a base material mounting table which is disposed opposite to the opening portion and holds a base material; and a moving mechanism which enables the chamber and the base material mounting table to relatively move, wherein the chamber is sandwiched between the two spiral coils. |
地址 |
Osaka JP |