Substrate holding device, exposure apparatus, and device manufacturing method

摘要

To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus is provided with a base material, a first holding portion formed on the base material for holding the substrate, and a second holding portion formed on the base material for holding a plate member by surrounding the circumference of a processing substrate held by the first holding portion. The second holding portion holds the plate member so as to form a second space on the side of the rear surface of the plate member. On the rear surface of the plate member, an absorbing member is arranged for absorbing the liquid entered from a gap between the substrate held by the first holding portion and the plate member held by the second holding portion.

主权项

1. An exposure apparatus that exposes a substrate via a projection optical system and via a liquid immersion region, which is formed with a liquid supplied below the projection optical system, the exposure apparatus comprising:
a stage that is capable of moving relative to the projection optical system, wherein the stage comprises:
a supporting portion that comprises a plurality of supports supporting a rear surface of the substrate;a porous member located at a level lower than a gap formed by the substrate supported by the supporting portion and an upper surface of the stage, the upper surface being located around the supporting portion, the porous member being configured to keep the liquid from the gap;a recovery portion having a recovery port located below the porous member that recovers the liquid from the porous member via the recovery port;a first peripheral wall portion that is provided to surround the supporting portion and that is provided so that the rear surface of the substrate supported by the supporting portion faces the first peripheral wall portion; anda suction port facing a space surrounded by the first peripheral wall portion and configured to suck gas in the space, wherein the porous member is disposed outside the first peripheral wall portion, and wherein at least a part of the porous member is located directly below an overhang region of the substrate supported by the supporting portion, the overhang region overhanging the first peripheral wall portion.