发明名称 Process to form aqueous precursor and aluminum oxide film
摘要 One disclosed embodiment concerns an aqueous inorganic coating precursor solution comprising a mixture of water, polynuclear aluminum hydroxide cations, and polyatomic ligands selected from nitrate (NO3−), nitrite (NO2−), or combinations thereof. In certain embodiments, the composition has a molar concentration ratio of polyatomic ligands to aluminum of less than 3; an aluminum cation concentration of from about 0.01 M to about 3.5 M; and/or a polyatomic anion concentration of from about 0.1 to about 2.5 times the aluminum cation concentration. Embodiments of a method for forming the precursor solution also are disclosed. For example, certain embodiments comprise adding a metal having a sufficient reduction potential to reduce nitric acid to an aqueous solution comprising aluminum nitrate (Al(NO3)3).
申请公布号 US9340678(B2) 申请公布日期 2016.05.17
申请号 US201113703592 申请日期 2011.06.14
申请人 State of Oregon acting by and through the State Board of Higher Education on behalf of Oregon State University 发明人 Keszler Douglas A.;Wang Wei
分类号 B05D5/12;C09D1/00;H01L31/0216;H01L31/18;C23C18/12 主分类号 B05D5/12
代理机构 Klarquist Sparkman, LLP 代理人 Klarquist Sparkman, LLP
主权项 1. A method for forming a thin film of Al2O3 on a substrate, the method comprising: forming a layer of precursor coating material comprising water, Al13(OH)24(H2O)24](NO3)15, or a combination of Al13(OH)24(H2O)24](NO3)15 and Al(NO3)3, on a substrate, thereby forming a coated substrate; heating the coated substrate to remove ligands and at least a portion of the water; and heating the coated substrate at a temperature within a temperature range of between about 100° C. and about 900° C. to eliminate water and to form and densify a thin film of Al2O3 having a thickness of 0.5 nm to 2,000 nm on the substrate.
地址 Corvallis OR US