发明名称 |
Process to form aqueous precursor and aluminum oxide film |
摘要 |
One disclosed embodiment concerns an aqueous inorganic coating precursor solution comprising a mixture of water, polynuclear aluminum hydroxide cations, and polyatomic ligands selected from nitrate (NO3−), nitrite (NO2−), or combinations thereof. In certain embodiments, the composition has a molar concentration ratio of polyatomic ligands to aluminum of less than 3; an aluminum cation concentration of from about 0.01 M to about 3.5 M; and/or a polyatomic anion concentration of from about 0.1 to about 2.5 times the aluminum cation concentration. Embodiments of a method for forming the precursor solution also are disclosed. For example, certain embodiments comprise adding a metal having a sufficient reduction potential to reduce nitric acid to an aqueous solution comprising aluminum nitrate (Al(NO3)3). |
申请公布号 |
US9340678(B2) |
申请公布日期 |
2016.05.17 |
申请号 |
US201113703592 |
申请日期 |
2011.06.14 |
申请人 |
State of Oregon acting by and through the State Board of Higher Education on behalf of Oregon State University |
发明人 |
Keszler Douglas A.;Wang Wei |
分类号 |
B05D5/12;C09D1/00;H01L31/0216;H01L31/18;C23C18/12 |
主分类号 |
B05D5/12 |
代理机构 |
Klarquist Sparkman, LLP |
代理人 |
Klarquist Sparkman, LLP |
主权项 |
1. A method for forming a thin film of Al2O3 on a substrate, the method comprising:
forming a layer of precursor coating material comprising water, Al13(OH)24(H2O)24](NO3)15, or a combination of Al13(OH)24(H2O)24](NO3)15 and Al(NO3)3, on a substrate, thereby forming a coated substrate; heating the coated substrate to remove ligands and at least a portion of the water; and heating the coated substrate at a temperature within a temperature range of between about 100° C. and about 900° C. to eliminate water and to form and densify a thin film of Al2O3 having a thickness of 0.5 nm to 2,000 nm on the substrate. |
地址 |
Corvallis OR US |