| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate liquid processing device which can maintain a nozzle arm in a clean state with the suppression of contamination in the device.SOLUTION: In a substrate liquid processing device 16, a processing liquid nozzle 41 held by nozzle arms 42, 43 supplies a processing liquid to a substrate W held by a substrate holding unit 31. A drive mechanism 44 moves the processing liquid nozzle 41 between a position in which the processing liquid is supplied to the substrate W and a retraction position. An arm washing tank 23 dips the nozzle arms 42, 43 into a clearing solvent to clean the whole area of the arm members.SELECTED DRAWING: Figure 4 |
