发明名称 HOME PORT, APPARATUS FOR TREATING SUBSTRATE INCLUDING THIS AND METHOD FOR REMOVING STATIC ELECTRICITY
摘要 The present invention relates to a substrate treating apparatus. The substrate treating apparatus according to an embodiment of the present invention includes a housing, a substrate support unit, a solution supply unit having a nozzle for injecting a process solution, and a home port in which the nozzle stands by. The home port includes a body having an injection space and a solution injection unit. The solution injection unit sprays a static electricity removing solution including a surfactant to the nozzle which stands by in the home port, and then removes the static electricity from the nozzle by spraying a static electricity removing solution including thinner. So, the static electricity of the nozzle can be removed.
申请公布号 KR20160054142(A) 申请公布日期 2016.05.16
申请号 KR20140153044 申请日期 2014.11.05
申请人 SEMES CO., LTD. 发明人 KIM, DAE MIN;LEE, JUNG HYUN;CHOI, JONG SU
分类号 H01L21/027;G03F7/20;H01L21/02 主分类号 H01L21/027
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