SUBSTRATE LIQUID PROCESSING DEVICE, SUBSTRATE LIQUID PROCESSING METHOD, AND COMPUTER READABLE RECORDING MEDIUM STORING SUBSTRATE LIQUID PROCESSING PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a substrate liquid processing device (substrate liquid processing method) capable of excellently drying a substrate after liquid processing.SOLUTION: Using a substrate liquid processing device (1) having a pure water supply part (rinse liquid supply part (22)) for supplying pure water to a substrate (3), and a drying liquid supply part (23) for supplying the drying liquid having higher volatility than the pure water to the substrate, the drying liquid containing a silicon organic compound in a part of the drying liquid having high volatility is supplied to the substrate (3) from the drying liquid supply part (23).SELECTED DRAWING: Figure 2