| 摘要 |
PROBLEM TO BE SOLVED: To provide a production method with which a material for semiconductor lithography having reduced metal impurity concentration can be produced, and a production device thereof.SOLUTION: In a production method of a material for semiconductor lithography, which is a polymer for semiconductor lithography, a solution of the polymer, or a composition including the polymer, the production method of the material for semiconductor lithography includes a step to feed a liquid material with a feed pipe formed by connecting a plurality of piping members, and a connection member selected from a group of (1)-(3) is provided on a part where the piping members are connected with each other in the feed pipe: (1) a connection member composed of a perfluoroelastomer, (2) a connection member composed of a fluororubber, and (3) a connection member formed by coating a surface of a rubber substrate with a perfluoro resin.SELECTED DRAWING: None |
