PROCESSING SYSTEM CONTAINING AN ISOLATION REGION SEPARATING A DEPOSITION CHAMBER FROM A TREATMENT CHAMBER

摘要

The present invention discloses a method and an apparatus for processing a substrate in a processing system including a deposition chamber, a process chamber and an isolation region which separates the deposition chamber from the process chamber. The deposition chamber deposits a film on a substrate. The process chamber accommodates the substrate from the deposition chamber, and changes the film deposited by the deposition chamber by using a film characteristic change device. Provided are processing systems and methods according to the embodiment and other embodiments. So, an improved semiconductor processing system suitable for successive deposition and processing can be provided.