发明名称 MASKING METHOD AND METHOD FOR FORMING ANTIREFLECTION LAYER
摘要 PROBLEM TO BE SOLVED: To provide a method for readily providing masking with an exact boundary line.SOLUTION: The masking method includes: setting an elastic jig at a processing surface not to be subjected to masking in an inner wall surface of a substrate; enlarge the elastic jig in a processing direction of the substrate; and providing resist processing to the substrate while pressing the elastic jig onto the processing surface.SELECTED DRAWING: Figure 3
申请公布号 JP2016077991(A) 申请公布日期 2016.05.16
申请号 JP20140213877 申请日期 2014.10.20
申请人 RICOH IMAGING CO LTD 发明人 KINOSHITA TOSHIHISA
分类号 B05D1/32;B05D3/12;G02B7/02 主分类号 B05D1/32
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