SUBSTRATE LIQUID PROCESSING DEVICE, SUBSTRATE LIQUID PROCESSING METHOD, AND COMPUTER READABLE RECORDING MEDIUM STORING SUBSTRATE LIQUID PROCESSING PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a substrate liquid processing device (substrate liquid processing method) capable of reducing the amount of particles due to water mark while preventing a pattern from being destroyed during dry processing.SOLUTION: A substrate liquid processing method comprises: a liquid processing step for performing the liquid processing on a substrate using processing liquid; a rinse processing step for performing the rinse processing on the liquid-processed substrate using rinse liquid; and a repellent treatment step for performing repellent treatment on the rinse-processed substrate using repellent liquid. Then, this method comprises: a replacement processing step for performing the replacement processing on the repellent treated substrate using a replacement promotion solution; and a cleaning processing step for performing the cleaning processing on the repellent treated substrate using a cleaning solution. Thereafter, the cleaning solution is replaced with a dry solution having higher volatility than the cleaning solution, and this method includes a dry processing step for removing the dry solution from the substrate.SELECTED DRAWING: Figure 4