DRAWING APPARATUS, DRAWING METHOD, AND MANUFACTURING METHOD OF ARTICLE

摘要

PROBLEM TO BE SOLVED: To provide a drawing method and a drawing apparatus technique, capable for reducing deviation of a heat input region to a substrate.SOLUTION: A drawing method for irradiating a beam of one irradiation region to one band-shaped region on a substrate and drawing a pattern in each scanning of the substrate to the irradiation region of beam, includes: a first irradiation step for irradiating the beam to a part of regions 302 of a first region B1 in the first region B1 and a second region B2 which can formed by virtually dividing a drawn region formed by the beam of one irradiation region in a line along in a scanning direction; a second irradiation step that irradiates the beam to a part of regions 303 of the second region B2 after the first irradiation step; and a third irradiation step that irradiates the beam to a region that is in the first region B1 and is differ from a part of regions 304 of the first region B1 after the second irradiation step.SELECTED DRAWING: Figure 3