发明名称 STORAGE DEVICE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a storage device and a manufacturing method thereof, having a low contact resistance and excellent contact.SOLUTION: A storage device comprises: a substrate; a conductive wire L2 that extends in a first direction and is arranged to an upper side of the substrate, and has an end portion which becomes thinner toward to a tip parts; and a contact 200 that is electrically connected to the end portion of conductive wire L2 and at least a side surface of the end portion. In the contact 200, the end portion includes: a first part L2B that has a distance which is a minimal length from a circumference of the contact 200; and a second part L2E that extends from the part and has the distance of which the length from the of contact 200 is longer than the minimal length. Since the conductive wire L2 has the second part L2E, the distance from the circumference of contact 200 becomes large and, a contact member 110 can be is embedded into their.SELECTED DRAWING: Figure 5
申请公布号 JP2016082107(A) 申请公布日期 2016.05.16
申请号 JP20140213210 申请日期 2014.10.17
申请人 TOSHIBA CORP 发明人 KOBAYASHI YUSUKE;SUGIMAE KIKUKO
分类号 H01L27/105;H01L21/768;H01L23/522;H01L45/00;H01L49/00 主分类号 H01L27/105
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