| 摘要 |
PROBLEM TO BE SOLVED: To provide a drawing method and a drawing apparatus that is advantageous for drawing a pattern while reducing displacement of a charged particle beam due to charging.SOLUTION: The present invention relates to a drawing method for drawing a pattern by irradiating a charged particle beam to one band-shaped region 126 on a substrate 112 in each one of a radiation range 125 by scanning the substrate 112 to the radiation range 125 of charged particle beam in a first direction. The drawing method includes: a step of determining a drawing order so as to be separated a band-shaped first region to which the pattern is drew in an n round and a band-shaped second region to which the pattern is drew in an (n+1) round, (n) is defined as a natural number, in a second direction different from a first direction; and a step for drawing the pattern to the first region and the second region on the substrate 112 in the drawing order determined in the step.SELECTED DRAWING: Figure 4 |
