发明名称 WAFER PROTECTION APPARATUS
摘要 Disclosed is a wafer protection apparatus comprising a storage unit and a protection unit. The storage unit stores a wafer. The protection unit allows an air curtain including nitrogen to be formed at the entrance of the storage unit to separate the interior and exterior of the storage unit, thereby protecting the interior of the storage unit. According to the present invention, a wafer storage environment of the interior of the storage unit is maintained, thereby improving the quality of manufacturing a wafer.
申请公布号 KR20160053492(A) 申请公布日期 2016.05.13
申请号 KR20140152569 申请日期 2014.11.05
申请人 K.C.TECH CO., LTD. 发明人 LEE, SANG JUN
分类号 H01L21/673;H01L21/02 主分类号 H01L21/673
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