| 摘要 |
The present invention relates to a substrate processing apparatus. According to an embodiment of the present invention includes a housing which has an upper body and a lower body located under the upper body to be combined with the upper body, and has a process space generated by the combination between the upper body and the lower body; a support unit which is combined with the upper body, and supports the edge of the substrate in the process space; a fluid supply unit which supplies a fluid into the process space; a sealing member which is provided to a contact surface between the lower body and the upper body, and seals the process space from the outside; and a blocking plate which is installed between the sealing member and the support unit. The blocking plate faces the sealing member. So, the efficiency of a substrate drying process can be improved. |
