ELECTRODE, PLASMA CVD APPARATUS, FILM DEPOSITION METHOD AND MEMBER HAVING FILM

摘要

PROBLEM TO BE SOLVED: To provide an electrode capable of stably depositing a film and used for a plasma CVD apparatus.SOLUTION: An electrode for a plasma CVD apparatus comprises: an electrode body 11 having a first surface 13 and a second surface 14 on the side opposite to the first surface 13; and a nozzle 12 for passing a film deposition material from the side of the first surface 13 to the side of the second surface 14. The nozzle 12 is arranged so as to penetrate the electrode body 11 and has a third surface 15 intersecting a direction toward the second surface 14 from the first surface 13. When the nozzle 12 is viewed from the side of the second surface 14, the third surface 15 overlaps with the second surface 14.SELECTED DRAWING: Figure 2