| 发明名称 |
ELECTROCHEMICAL CELL |
| 摘要 |
An electrochemical cell includes at least a base container, a cell which is accommodated in the base container, a plurality of cell leads which are extension portions of the cell, a pad film which is formed of valve metal on a base bottom surface, and a base-embedded wiring (a via wiring) which is connected to the pad film and is formed in a portion between the base bottom surface and a base lower surface, in which at least one of the cell leads and the pad film are fixed to each other through ultrasonic welding, and when a horizontal distance between a welding portion and the base-embedded wiring in the pad film is set to be L, and tolerance relating to an installation position of the base-embedded wiring is set to be a, L≧a×1.3 is established. |
| 申请公布号 |
US2016133894(A1) |
申请公布日期 |
2016.05.12 |
| 申请号 |
US201514884042 |
申请日期 |
2015.10.15 |
| 申请人 |
Seiko Instruments Inc. |
发明人 |
ONODERA Takashi;SATO Ryo;SUZUKI Tadahito |
| 分类号 |
H01M2/10;H01G11/78;H01G11/74;H01M2/20 |
主分类号 |
H01M2/10 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An electrochemical cell comprising at least:
a base container; a cell which is accommodated in the base container; a plurality of cell leads which are extension portions of the cell; a pad film which is formed of valve metal on a bottom surface of the base container; and a base-embedded wiring which is connected to the pad film and is formed in a portion between the bottom surface and a lower surface of the base container, wherein at least one of the cell leads and the pad film are fixed to each other through ultrasonic welding, and wherein when a horizontal distance between a welding portion and the base-embedded wiring in the pad film is set to be L, and tolerance relating to an installation position of the base-embedded wiring is set to be a, L≧a×1.3 is established. |
| 地址 |
Chiba-shi JP |
