ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

摘要

The present invention relates to: an active light sensitive or radiation sensitive resin composition; an active light sensitive or radiation sensitive film using the active light sensitive or radiation sensitive resin composition; a mask blank which is provided with this film; a pattern forming method; a method for manufacturing an electronic device, which comprises this pattern forming method; and an electronic device which is manufactured by this method for manufacturing an electronic device. An active light sensitive or radiation sensitive resin composition according to the present invention contains (A) an onium salt compound that contains at least one fluorine atom in the anionic component, while containing at least one nitrogen atom in the cationic component, and (B) a compound that contains at least one fluorine atom and generates an acid when irradiated with active light or radiation. The content ratio of the fluorine atoms in the compound (A) relative to the total mass of the compound (A) is higher than the content ratio of the fluorine atoms in the compound (B) relative to the total mass of the compound (B).