发明名称 METHOD FOR INDIRECT PLASMA TREATMENT OF RELEASE LAYERS
摘要 The invention relates to a method for the indirect plasma treatment of a release layer, comprising the following steps: introducing a plasma gas into a discharge area; exciting the plasma in a plasma state by discharging; blowing the plasma gas in a plasma state out from the discharge area; and exposing the release layer to the plasma gas in a plasma state after the blowing out of the plasma gas from the discharge area. The invention also relates to release layers which can be obtained according to said method; to release liners comprising a support and said type of release layer; and to adhesive strips comprising the claimed release liner and at least one adhesive mass.
申请公布号 WO2016071232(A1) 申请公布日期 2016.05.12
申请号 WO2015EP75282 申请日期 2015.10.30
申请人 TESA SE 发明人 BELOV, NIKOLAY;HÄHNEL, MARCEL;KOOPS, ARNE;NEUHAUS-STEINMETZ, HERMANN;PERLBACH, DENNIS;WINKLER, TOBIAS
分类号 C09J7/02;H05H1/00 主分类号 C09J7/02
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