发明名称 Charged Particle Beam Device
摘要 An object of the present invention is to provide a charged particle beam device that suppresses the influence of an external electromagnetic wave, even when a shielding member, such as a vacuum valve, is in the open state. To achieve the above object, a charged particle beam device including a vacuum chamber (111) having an opening (104) that surrounds a sample delivery path is proposed. The charged particle beam device includes a conductive material (118) surrounding the opening (104) for conduction between the vacuum chamber (111) and a conductive member (106) disposed on the atmosphere side. According to an embodiment of the present invention, it is possible to restrict an electromagnetic wave (117) from reaching the sample chamber via the delivery path.
申请公布号 US2016133433(A1) 申请公布日期 2016.05.12
申请号 US201414893669 申请日期 2014.03.19
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 FUJITA Masashi;TSUNODA Masahiro;ONUKI Katsunori;AIBARA Katsuya;SHINDO Seiichi;NISHIMORI Takaaki
分类号 H01J37/16;H01J37/18 主分类号 H01J37/16
代理机构 代理人
主权项 1. A charged particle beam device including a vacuum chamber, the vacuum chamber having an opening that surrounds a sample delivery path, the vacuum chamber comprising: a conductive material configured to surround the opening for conduction between the vacuum chamber and a conductive member disposed on the atmosphere side.
地址 Tokyo JP