| 摘要 |
PROBLEM TO BE SOLVED: To provide a production method of an organic process liquid for patterning a chemically amplified resist film, the organic process liquid capable of reducing generation of particles, particularly in negative pattern forming technology for forming a fine pattern by use of an organic developer, an organic process liquid for patterning a chemically amplified resist film by using the above method, a pattern forming method, a method for manufacturing an electronic device, and an electronic device.SOLUTION: The production method of an organic process liquid for patterning includes a step of allowing a liquid comprising an organic solvent to pass through a filtration device that includes a liquid inlet, a liquid outlet, and a filtration membrane disposed in a flow passage connecting the liquid inlet and the liquid outlet. An absolute value of a difference between a temperature of the liquid at the liquid inlet and a temperature of the liquid at the liquid outlet is 3°C or less; a filtration speed of the liquid in the filtration device is 0.5 L/min/mor more; and a filtration pressure of the liquid in the filtration device is 0.1 MPa or less.SELECTED DRAWING: None |
