发明名称 POLISHING PAD, SHEET FOR POLISHING PAD, AND MANUFACTURING METHOD OF POLISHING MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a polishing pad with excellent polishing characteristics, a sheet for the polishing pad, and a manufacturing method of polishing material.SOLUTION: A polishing pad 100 includes a polishing layer 101 having a plurality of hollow spheres 111 and a polymer 110. The plurality of hollow spheres 111 have outer shells formed of thermoplastic resin. The polymer 110 contains the plurality of hollow spheres 111, and is generated by polymerization reaction of a prepolymer and a curing agent. The polymer 110 is cured in a shorter time than a time until internal heat storage by the polymerization reaction reaches a maximum temperature.SELECTED DRAWING: Figure 2
申请公布号 JP2016074044(A) 申请公布日期 2016.05.12
申请号 JP20140203941 申请日期 2014.10.02
申请人 FUJIBO HOLDINGS INC 发明人 MIYASAKA HIROHITO;TATENO TEPPEI;MATSUOKA RYUMA;KIRAKU YOSHIE;SAEKI TAKU
分类号 B24B37/24;H01L21/304 主分类号 B24B37/24
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