RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING POLYMER PROVIDED WITH ARYLENE GROUPS

摘要

[Problem] To provide a resist underlayer film-forming composition which is used in a lithographic process, exhibits excellent flatness-imparting performance on stepped substrates, and excellent embedding performance into fine hole patterns, and is characterized in that a wafer surface after film formation is made flat. [Solution] This resist underlayer film-forming composition includes: a polymer including a unit structure represented by formula (1); and a solvent.