METHOD OF FABRICATING NANO STRUCTURED FILM INCLUDING NITROGEN AND AMORPHOUS FILM

摘要

The present invention relates to a method to manufacture a nanostructure film including an amorphous film and nitrogen which obtains a low friction property with high hardness and adhesion property, and also remarkably obtains a low coefficient value of friction. The method to manufacture the nanostructure film including an amorphous film and nitrogen comprises a step of forming the nanostructure film including nitrogen by sputtering an alloy target while a reaction gas containing nitrogen gas (N_2) or a nitrogen element (N) is injected inside a sputtering device. The alloy target is formed of a crystalline alloy comprising: 58-80 atom% of Zr; 4-26 atom% of Cu; and 4-26 atom% of one or more selected among Fe, Ni, and Co.