| 摘要 |
PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus in which the likelihood of bubble inclusion is at least reduced.SOLUTION: An immersion lithographic apparatus includes: a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system PS and a substrate W and/or table WT; and a gas supplying device configured to supply gas with a solubility in the immersion liquid greater than 5x10mol/kg at 20°C and 1 atm total pressure to an area adjacent to the space.SELECTED DRAWING: Figure 1 |
