发明名称 METHOD OF MANUFACTURING A SILICON INGOT AND SILICON INGOT
摘要 A method of Czochralski growth of a silicon ingot includes melting a mixture of silicon material and an n-type dopant material in a crucible. The silicon ingot is extracted from the molten silicon during an extraction time period. The silicon ingot is doped with additional n-type dopant material during at least one sub-period of the extraction time period.
申请公布号 US2016130722(A1) 申请公布日期 2016.05.12
申请号 US201414535416 申请日期 2014.11.07
申请人 Infineon Technologies AG 发明人 Caspary Nico;Schulze Hans-Joachim
分类号 C30B15/04;C30B29/06;C01B33/02;C30B31/06 主分类号 C30B15/04
代理机构 代理人
主权项 1. A method of Czochralski growth of a silicon ingot, the method comprising: melting a mixture of silicon material and an n-type dopant material in a crucible; extracting the silicon ingot from the molten silicon during an extraction time period; and doping the silicon ingot with additional n-type dopant material during at least one sub-period of the extraction time period.
地址 Neubiberg DE