| 发明名称 |
IMPRINT METHOD, IMPRINT APPARATUS, MOLD, AND ARTICLE MANUFACTURING METHOD |
| 摘要 |
Provided is an imprint method that molds an uncured resin applied to a substrate by a pattern portion formed on a mold and cures the uncured resin so as to form the pattern of the resin cured on the substrate. The imprint method includes a step of releasing the pattern portion from the resin such that two opposed boundaries are brought closer to each other to progress peeling while maintaining a parallel state after curing of the resin based on the assumption that the boundary at which the pattern portion is peeled from the resin is linear. |
| 申请公布号 |
US2016129612(A1) |
申请公布日期 |
2016.05.12 |
| 申请号 |
US201514921112 |
申请日期 |
2015.10.23 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Seki Junichi;Okinaka Motoki |
| 分类号 |
B29C33/50;G03F7/00;B29C59/02 |
主分类号 |
B29C33/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An imprint method for forming a pattern on an imprint material applied to a substrate with use of a mold, the imprint method comprising a step of:
releasing the mold from the imprint material such that two opposed boundaries are brought closer to each other while maintaining a linear state after curing of the imprint material based on the assumption that the boundaries at which the mold is peeled from the imprint material are linear lines. |
| 地址 |
Tokyo JP |
