| 摘要 |
The present invention relates to an apparatus for cleaning a substrate. According one embodiment, the apparatus for cleaning a substrate includes: a spin chuck to support and rotate the substrate; a rotation driving part to rotate the spin chuck; and a ring-shaped blower disposed on the top of the substrate to supply air onto the substrate. The blower includes a ring-shaped pipeline configured to guide the air to the top of the substrate, and an air spray tip attached to the pipeline to spray the air toward the substrate. By using the constituents, a uniform clean air zone can be formed on the immediately upper portion and the edge of the substrate by uniformly spraying the air to the surroundings of the substrate. Therefore, the cleaning and drying processes for the substrate can be uniformly performed, and a defect caused by the confused air flow or re-attachment of fume can be prevented, so atmospheric environment suitable for the cleaning and drying processes can be made. |
