| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid immersion exposure apparatus which has two substrate stages and in which entanglement of cables to be connected respectively to the two substrate stages is prevented and the length of each of the cables is shortened.SOLUTION: In the liquid immersion exposure apparatus, a control unit controls drives of wafer stages WST1, WST2 and moves them relatively so that one of the wafer stages WST1, WST2 is approached to the other thereof. When both of the wafer stages are approached to a nozzle unit, a liquid immersion area 14 is moved from one of the wafer stages to the other thereof while being kept under a projection optical system and the cable is connected to the wafer stage WST1 from -X side and the cable is connected to the wafer stage WST2 from +X other side. By the control unit, both of the wafer stages WST1, WST2 are driven from an exposure position to an exchange position through feedback passages (which are positioned respectively on the -X side and the +X side of the exposure position (the liquid immersion area 14)) different from each other.SELECTED DRAWING: Figure 57 |
