发明名称 |
METHOD OF MANUFACTURING A MASK |
摘要 |
A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern. |
申请公布号 |
US2016131970(A1) |
申请公布日期 |
2016.05.12 |
申请号 |
US201614994404 |
申请日期 |
2016.01.13 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
Heo Jin-Seok;Park Chang-Min;Oh Seok-Hwan;Yeo Jeong-Ho |
分类号 |
G03F7/00;B29C35/08 |
主分类号 |
G03F7/00 |
代理机构 |
|
代理人 |
|
主权项 |
1. A method of manufacturing a mask, the method comprising:
dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate; correcting a distorted region among the regions; pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern. |
地址 |
Suwon-si KR |