发明名称 METHOD OF MANUFACTURING A MASK
摘要 A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern.
申请公布号 US2016131970(A1) 申请公布日期 2016.05.12
申请号 US201614994404 申请日期 2016.01.13
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 Heo Jin-Seok;Park Chang-Min;Oh Seok-Hwan;Yeo Jeong-Ho
分类号 G03F7/00;B29C35/08 主分类号 G03F7/00
代理机构 代理人
主权项 1. A method of manufacturing a mask, the method comprising: dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate; correcting a distorted region among the regions; pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern.
地址 Suwon-si KR