| 发明名称 |
TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS |
| 摘要 |
A topcoat composition comprises: a matrix polymer; a surface active polymer comprising: a first unit comprising a group of the following general formula (I):;;wherein R1 represents H, F, C1 to C8 alkyl or C1 to C8 fluoroalkyl, optionally comprising one or more heteroatom; X1 represents oxygen, sulfur or NR2, wherein R2 is chosen from hydrogen and optionally substituted C1 to C10 alkyl; and a solvent. The surface active polymer is present in the composition in an amount less than the matrix polymer, and the surface active polymer has a lower surface energy than a surface energy of the matrix polymer. The invention has particular applicability in photolithographic processes as a photoresist topcoat layer in the manufacture of semiconductor devices. |
| 申请公布号 |
US2016130462(A1) |
申请公布日期 |
2016.05.12 |
| 申请号 |
US201514929533 |
申请日期 |
2015.11.02 |
| 申请人 |
Rohm and Haas Electronic Materials LLC |
发明人 |
LIU Cong;KANG Doris H.;WANG Deyan;XU Cheng-Bai;LI Mingqi |
| 分类号 |
C09D133/16;G03F7/11;G03F7/20 |
主分类号 |
C09D133/16 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A topcoat composition, comprising:
a matrix polymer; a surface active polymer comprising a first unit comprising a group of the following general formula (I): wherein R1 represents H, F, C1 to C8 alkyl or C1 to C8 fluoroalkyl, optionally comprising one or more heteroatom; X1 represents oxygen, sulfur or NR2, wherein R2 is chosen from hydrogen and optionally substituted C1 to C10 alkyl; and a solvent; wherein the surface active polymer is present in the composition in an amount less than the matrix polymer, and the surface active polymer has a lower surface energy than a surface energy of the matrix polymer. |
| 地址 |
Marlborough MA US |
