A RESIST PATTERN FORMING APPARATUS, A RESIST PATTERN FORMING METHOD

摘要

Provided are a resist pattern forming apparatus capable of preventing formation of stripping residues, and a resist pattern forming method. More specifically, the present invention relates to a resist pattern forming apparatus which comprises: a spreading device forming a resist film on a substrate by spreading a positive resist composition; a developing device forming a pre-pattern by developing the resist film; a first heating device heating the pre-pattern for a certain time at a dew point ranging from -50 to -5 °C; and a light irradiation part curing the pre-pattern by irradiating the same with light after heat application.