LITHOGRAPHY DATA GENERATION METHOD, PROGRAM, MULTI-CHARGED PARTICLE BEAM LITHOGRAPHY DEVICE AND PATTERN INSPECTION DEVICE

摘要

PROBLEM TO BE SOLVED: To generate lithography data capable of suppressing a data amount and computational complexity within a multi-charged particle beam lithography device.SOLUTION: A polygonal graphic included in design data is divided into a plurality of trapezoidal graphics in which at least a pair of opposite sides are parallel in a first direction and which are coupled in a second direction orthogonal with the first direction while defining the sides parallel with the first direction as common sides. A position of an apex common for a first trapezoid and a second trapezoid neighboring to the first trapezoid is represented by displacement in the first direction and the second direction from a position of an apex common for the second trapezoid and a third trapezoid neighboring to the second trapezoid, thereby generating the lithography data.SELECTED DRAWING: Figure 2