DENSITY MULTIPLICATION AND IMPROVED LITHOGRAPHY BY DIRECTED BLOCK COPOLYMER ASSEMBLY

摘要

Methods to pattern substrates with dense periodic nanostructures that combine top-down lithographic tools and self-assembling block copolymer materials are provided. According to various embodiments, the methods involve chemically patterning a substrate, depositing a block copolymer film on the chemically patterned imaging layer, and allowing the block copolymer to self-assemble in the presence of the chemically patterned substrate, thereby producing a pattern in the block copolymer film that is improved over the substrate pattern in terms feature size, shape, and uniformity, as well as regular spacing between arrays of features and between the features within each array compared to the substrate pattern. In certain embodiments, the density and total number of pattern features in the block copolymer film is also increased. High density and quality nanoimprint templates and other nanopatterned structures are also provided.

主权项

1. A method of forming dense periodic patterns, the method comprising: receiving a first pattern on a substrate, wherein said first pattern comprises pattern features defined by activated regions on the substrate; depositing a block copolymer material on the first pattern; ordering the block copolymer material to form a second pattern comprising pattern features defined by microphase-separated domains of the block copolymer material, wherein the features of the second pattern correspond to features of the first pattern and wherein the feature density of the second pattern is greater than that of the first pattern.