发明名称 LOW-TEMPERATURE POLYCRYSTALLINE SILICON SEMICONDUCTOR THIN-FILM TRANSISTOR-BASED GOA CIRCUIT
摘要 A low-temperature polycrystalline silicon semiconductor thin-film transistor-based GOA circuit comprising multiple cascade GOA units. A level N GOA unit comprises a pull-up control part (100), a pull-up part (200), a first pull-down part (400), and a pull-down holding circuit part (500). The pull-down holding circuit part (500) employs a high-low potential backstepping design and is provided with consecutively lowered first, second, and third direct current constant voltage potentials (VSS1, VSS2, and VSS3) and a direct current constant voltage high potential (H). This solves an impact on a GOA driver circuit by properties of the low temperature polysilicon semiconductor thin-film transistor itself, particularly a GOA functional shortcoming brought forth by the problem of electric leakage, also solves the problem that the potential of a second node (P(N)) in the pull-down holding circuit part in an existing low-temperature polycrystalline silicon semiconductor thin-film transistor-based GOA circuit cannot remain at an increased potential during inactivity, and effectively maintains a low potential for a first node (Q(N)) and an output end (G(N)).
申请公布号 WO2016070509(A1) 申请公布日期 2016.05.12
申请号 WO2015CN72354 申请日期 2015.02.06
申请人 SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO.,LTD. 发明人 XIAO, JUNCHENG
分类号 G09G3/36 主分类号 G09G3/36
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