| 摘要 |
The present invention relates to a clamp assembly which is fixed to a support body in a plasma processing chamber in a form in which RF bias power is applied to the support body while a plasma process of a substrate is performed on an outer peripheral portion of the substrate. The clamp assembly comprises: an outer clamp member; and an inner clamp member which is accommodated by the outer clamp member, wherein the inner clamp member defines an aperture which exposes the substrate to the plasma process, the outer clamp has an inner portion which is terminated into an inner corner, and the inner portion is separated from the inner clamp member. |
