发明名称 |
薄膜トランジスタ表示板の製造方法 |
摘要 |
A method for manufacturing a thin film transistor array panel includes forming a gate line; forming an insulating layer on the gate line; forming first and second silicon layers first and second metal layers; forming a photoresist pattern having first and second portions; forming first and second metal patterns by etching the first and second metal layers; processing the first metal pattern with SF6 or SF6/He; forming silicon and semiconductor patterns by etching the second and first silicon layers; removing the first portion of the photoresist pattern; forming an upper layer of a data wire by wet etching the second metal pattern; forming a lower layer of the data wire and an ohmic contact by etching the first metal and amorphous silicon patterns; forming a passivation layer including a contact hole on the upper layer; and forming a pixel electrode on the passivation layer. |
申请公布号 |
JP5917015(B2) |
申请公布日期 |
2016.05.11 |
申请号 |
JP20110100695 |
申请日期 |
2011.04.28 |
申请人 |
三星ディスプレイ株式會社Samsung Display Co.,Ltd. |
发明人 |
楊 東 周;金 泰 佑;李 基 曄;崔 新 逸;丁 有 光;宋 ▲ジャン▼ 鎬 |
分类号 |
H01L21/336;G02F1/1368;H01L21/28;H01L21/3213;H01L21/768;H01L29/417;H01L29/786 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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