| 摘要 |
A lithographic apparatus with a cover plate (60) formed separately from a substrate table (WT) and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion (12) and improve position control of a substrate by reference to the substrate table distortion is disclosed. |
