| 摘要 |
The invention provides a photomask used for display device manufacturing, and pattern transfer printing method. In the photomask which is used for display device manufacturing and is provided with patterns used for transfer printing, the patterns for transfer printing comprise a main pattern, and an auxiliary pattern. The main pattern is formed by a light transmitting portion, and diameter is lower than 4 [mu]m. The auxiliary pattern is configured on the periphery of the main pattern, and has width which cannot be distinguished by exposure. The auxiliary pattern is formed by a light transmitting portion. Phase difference does not substantially exist between exposure light transmitting the main pattern and exposure light transmitting the auxiliary pattern. When a distance between the center of the main pattern and the center of the auxiliary pattern is set as P ([mu]m), the distance P is set to make +/-1 order diffraction light generated by light interference enter an optical system of an exposure machine used for exposure, the light interference being generated by exposure light transmitting the main pattern and exposure light transmitting the auxiliary pattern. |
