| 摘要 |
An object of the present invention is to provide a coating apparatus and a coating method, capable of preventing a coating solution, which is discharged from a nozzle at an initial stage, from being coated in a swollen state when coating processing is started even in the case of a pressing feeding scheme, and capable of coating the coating solution on a target to be coated while maintaining a proper coating thickness from a time point at which the coating processing is started. In addition, the configuration can be simplified, and the thickness adjustment of a coating layer can be easily controlled. To this end, the coating apparatus includes a coating solution feeding source (2), a nozzle (12), an opening/closing valve (13), and a buffer tank (15). The coating solution feeding source feeds undercurrent coating solution (b) in a tank (3) to a coating solution feeding system (9) by pushing the undercurrent coating solution (b) to the coating solution feeding system (9) through pressing. The nozzle (12) is coupled to the solution feeding system to discharge the coating solution to be fed while moving relatively to the target (11) to be coated to perform the coating processing with respect to the target to be coated. The opening/closing valve (13) is provided in the solution feeding system and open when the coating processing is started so that the coating solution is supplied to the nozzle. In addition, the opening/closing valve (13) is closed to stop the feeding of the coating solution to the nozzle. The buffer tank (15) is provided in the coating feeding system and fully filled with the coating solution. When the opening/closing valve is open, the change in the pressure propagated toward the nozzle is restricted. |
